Effect of molecular weight distribution on e-beam exposure properties of polystyrene
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چکیده
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چکیده ندارد.
15 صفحه اولHigh molecular weight polystyrene as very sensitive electron beam resist
0167-9317/$ see front matter 2012 Elsevier B.V. A http://dx.doi.org/10.1016/j.mee.2012.07.005 ⇑ Corresponding author. Tel.: +1 519 729 3582. E-mail addresses: [email protected], j24 (J. Zhang). Previously we demonstrated ultra-dense patterning using 2 kg/mol polystyrene negative electron beam resist that has low sensitivity [16]. To drastically improve its sensitivity, here we studied the expos...
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ژورنال
عنوان ژورنال: Nanotechnology
سال: 2013
ISSN: 0957-4484,1361-6528
DOI: 10.1088/0957-4484/24/24/245302